
TSMC 2030 წელს დაიწყებს High-NA EUV ლითოგრაფიის გამოყენებას
TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use
აირჩიე თარიღი და ნახე იმ დღის ამბები.
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TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use

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